GEC Plasma Chamber |  |
This tutorial guides the user through the process of performing PECVD (Plasma-Enhanced Chemical Vapor Deposition) simulations, with a focus on key setup and analysis techniques. The user will learn how to define domain settings for PECVD, etching, and sputtering, including timestepping, PIC options, fluid options, and advanced options. Additionally, the user will be instructed on how to assign body materials, set electromagnetic, PIC, sheath, and fluid boundary conditions, and choose an appropriate mesh resolution. The tutorial also covers the use of 2D slice models and provides guidance on visualizing and processing simulation data. Upon completion, the user will have a solid understanding of RF plasma discharge simulations.
EMA3D - © 2025 EMA, Inc. Unauthorized use, distribution, or duplication is prohibited.